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Coating Applications

Low Temperature Deposition & Plasma Surface Treatments

Our Thin Films Research Center offers a variety of surface treatments (nitriding, oxidizing, boriding and carburizing) as well as thin film deposition of metals, ceramics, and other coatings. The laboratory takes advantage of our internationally-known scientists, advanced facilities and decades of experience in Thin Film Technology. The Coating Laboratory is currently serving a variety of strategic clients from High-tech, Textile , FMCG and Medical industries.

Technology Overview

New Dual Frequency technology (Microwave/Radio-frequency).
Magnetron RF or DC Sputtering
Inductive RF Plasma
Plasma Activated Chemical Vapor Deposition (100-450C), (PACVD)
Chemical Vapor Deposition (CVD) and Metal-Organic CVD (MOCVD)
Electron Beam Evaporation

Ceramic Coatings

Silicon Oxide - SiO2, Silicon Nitride - Si3N4, Silicon Carbide - SiC, Aluminum Nitride - AIN, Titanium-Aluminium Nitride - TiAIN, Titanium Nitride TiN, Boron Carbide - B4C, etc.

Metal Coatings

Aluminum, Titanium, Tantalum, Nickel, Gold, etc.

Other Coatings

Pyrolytic Carbon (PyC), Amorphous Carbon (a-C), Diamond-like Carbon (DLC) etc.

Surface Treatments

Nitriding: Ti alloys and Steels
Boriding: Ti, Ti alloys and steels
Carburizing: Tantalum
Oxidizing: Tantalum, Aluminum, Silicon etc.

Contact us

Rotem Industrial Park, Mishor Yamin, D.N Arava 86800, ISRAEL
Tel: +972 8 656 4769, Fax: +972 8 6555 984, Email: meni@rotemi.co.il


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