Coatings Technologies 

Low Temperature Deposition & Plasma Surface Treatments

Thin Films Research Center offers a variety of surface treatments (nitriding, oxidizing, boriding and

carburizing) as well as thin film deposition of metals, ceramics, and other coatings. The laboratory takes

advantage of our internationally-known scientists, advanced facilities and decades of experience in thin

film technology.

  • High Impulse Power Magnetron Sputtering (HiPPMS)
  • Magnetron Sputtering Deposition Assisted by Dual-Frequency, (Microwave/Radio-Frequency),


  • Magnetron RF, DC Pulse-DC Sputtering
  • Inductive RF Plasma
  • Plasma Activated Chemical Vapor Deposition (100-450°C), (PACVD)
  • Chemical Vapor Deposition (CVD) and Metal-Organic CVD (MOCVD)

Ceramic Coatings

  • Silicon Oxide – SiO2, Silicon Nitride – Si3N4, Silicon Carbide – SiC, Aluminum Nitride – AlN, Titanium-
  • Aluminum Nitride – TiAlN, Titanium Nitride TiN, Boron Carbide –B4C, etc.

Metal Coatings

  • Aluminum, Titanium, Tantalum, Nickel, Gold, etc.

Other Coatings

  • Pyrolytic Carbon (PyC), Amorphous Carbon (a-C), Diamond-like Carbon (DLC) etc.
  • Surface Treatments
  • Nitriding: Ti alloys and steels (TiN, FexNy)
  • Boriding: Ti, Ti alloys and steels (TiB2, FeB)
  • Carburizung: Tantalum (Ta2C-TaC), etc
  • Oxidizing: Tantalum (TaOx), Aluminum (Al2O3), Silicon (SiO2), etc